Title :
Influence of current annealing on the magnetic properties of amorphous and crystalline soft thin films
Author :
Coisson, M. ; Barrera, G. ; Celegato, F. ; Tiberto, P. ; Vinai, F. ; Fiore, G. ; Rizzi, P. ; Villacis, P. Viteri ; Battezzati, L.
Author_Institution :
Electromagn., INRIM, Turin, Italy
Abstract :
In this study, the magnetic properties of thin films prepared by sputtering are presented, before and after submission to current annealing [1]. Three compositions of soft magnetic materials are investigated: Co67Fe4Si14.5B14.5, Fe78Si9B13, Fe84.3Si2P4B8Cu0.7. Hysteresis loops and magnetic domain imaging (MOKE, MFM), together with structural techniques (EDX, TEM, XRD), are used to follow the effects of annealing, which include stress relaxation and crystallization .
Keywords :
Kerr magneto-optical effect; X-ray chemical analysis; X-ray diffraction; amorphous magnetic materials; annealing; boron alloys; cobalt alloys; copper alloys; crystallisation; iron alloys; magnetic domains; magnetic force microscopy; magnetic hysteresis; magnetic thin films; phosphorus alloys; silicon alloys; soft magnetic materials; sputtered coatings; stress relaxation; transmission electron microscopy; Co67Fe4Si14.5B14.5; EDX; Fe78Si9B13; Fe84.3Si2P4B8Cu0.7; MFM; MOKE; TEM; XRD; amorphous soft thin films; crystalline soft thin films; crystallization; current annealing; hysteresis loops; magnetic domain imaging; magnetic properties; soft magnetic materials; sputtering; stress relaxation; structural techniques; Annealing; Crystallization; Current measurement; Magnetic hysteresis; Magnetic properties; Microstructure; Substrates;
Conference_Titel :
Magnetics Conference (INTERMAG), 2015 IEEE
Conference_Location :
Beijing
Print_ISBN :
978-1-4799-7321-7
DOI :
10.1109/INTMAG.2015.7157707
