Influence of current annealing on the magnetic properties of amorphous and crystalline soft thin films

Author

Coisson, M. ; Barrera, G. ; Celegato, F. ; Tiberto, P. ; Vinai, F. ; Fiore, G. ; Rizzi, P. ; Villacis, P. Viteri ; Battezzati, L.

Author_Institution

Electromagn., INRIM, Turin, Italy

fYear

2015

fDate

11-15 May 2015

Firstpage

1

Lastpage

1

Abstract

In this study, the magnetic properties of thin films prepared by sputtering are presented, before and after submission to current annealing [1]. Three compositions of soft magnetic materials are investigated: Co₆₇Fe₄Si_14.5B_14.5, Fe₇₈Si₉B₁₃, Fe_84.3Si₂P₄B₈Cu_0.7. Hysteresis loops and magnetic domain imaging (MOKE, MFM), together with structural techniques (EDX, TEM, XRD), are used to follow the effects of annealing, which include stress relaxation and crystallization .

Keywords

Kerr magneto-optical effect; X-ray chemical analysis; X-ray diffraction; amorphous magnetic materials; annealing; boron alloys; cobalt alloys; copper alloys; crystallisation; iron alloys; magnetic domains; magnetic force microscopy; magnetic hysteresis; magnetic thin films; phosphorus alloys; silicon alloys; soft magnetic materials; sputtered coatings; stress relaxation; transmission electron microscopy; Co₆₇Fe₄Si_14.5B_14.5; EDX; Fe₇₈Si₉B₁₃; Fe_84.3Si₂P₄B₈Cu_0.7; MFM; MOKE; TEM; XRD; amorphous soft thin films; crystalline soft thin films; crystallization; current annealing; hysteresis loops; magnetic domain imaging; magnetic properties; soft magnetic materials; sputtering; stress relaxation; structural techniques; Annealing; Crystallization; Current measurement; Magnetic hysteresis; Magnetic properties; Microstructure; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference (INTERMAG), 2015 IEEE

Conference_Location

Beijing

Print_ISBN

978-1-4799-7321-7

Type

conf

DOI

10.1109/INTMAG.2015.7157707

Filename

7157707