Title :
Demonstration of 20µm pitch micro-vias by excimer laser ablation in ultra-thin dry-film polymer dielectrics for multi-layer RDL on glass interposers
Author :
Suzuki, Yuya ; Brune, Jan ; Senczuk, Rolf ; Patzel, Rainer ; Furuya, Ryuta ; Fuhan Liu ; Sundaram, Venky ; Tummala, Rao
Author_Institution :
R&D Center, Zeon Corp., Kawasaki, Japan
Abstract :
This paper describes the first demonstration of 8-10μm diameter micro-vias at 20μm pitch in ultra-thin dry-film polymer dielectrics to achieve high-density and low-cost redistribution layers (RDL) on panel-based glass and organic interposers. A polymer dielectric dry-film, ZEONIF ZS100, at 10μm thickness was double side laminated on thin and low CTE glass and organic substrates. Micro-via arrays at 20μm pitch were formed by 248nm KrF excimer laser ablation using mask projection scanning, and metallized by a semi-additive process (SAP) using electroless and electrolytic copper plating, with no chemical-mechanical polishing to form fully filled via structures. Fully-filled micro-vias at 20um were achieved using processes scalable to large panels for low-cost and high-density 2.5D and 3D interposers.
Keywords :
electroplating; integrated circuit interconnections; laser ablation; three-dimensional integrated circuits; vias; ZEONIF ZS100; electroless copper plating; electrolytic copper plating; excimer laser ablation; fully filled via structures; glass interposers; high density redistribution layer; low cost redistribution layer; mask projection scanning; multilayer RDL; organic interposer; panel based glass; pitch microvias; polymer dielectric dry film; semi additive process; size 20 mum; size 8 mum to 10 mum; ultrathin dry film polymer dielectrics; Copper; Dielectrics; Laser ablation; Laser noise; Polymers; Wiring;
Conference_Titel :
Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
Conference_Location :
San Diego, CA
DOI :
10.1109/ECTC.2015.7159704