• DocumentCode
    723156
  • Title

    Demonstration of a novel low cost single material temporary bond solution for high topography substrates based on a mechanical wafer debonding and innovative adhesive removal

  • Author

    Phommahaxay, Alain ; Nakamura, Atsushi ; Jourdain, Anne ; Verbinnen, Greet ; Kamochi, Yoshitaka ; Koyama, Ichiro ; Iwai, Yu ; Sawano, Mitsuru ; Tan, Shiro ; Miller, A. ; Beyer, Gerald ; Sleeckx, E. ; Beyne, Eric

  • Author_Institution
    Imec, Leuven, Belgium
  • fYear
    2015
  • fDate
    26-29 May 2015
  • Firstpage
    1430
  • Lastpage
    1435
  • Abstract
    Among the technological developments pushed by the emergence of 3D-ICs, wafer thinning has become a key element in device processing over the past years. As technology matures, more emphasis is now being put on the overall cost of ownership, which is still regarded as a refraining element for technology adoption. Therefore novel temporary bond concepts and materials are being explored to further bring down the process complexity and cost.
  • Keywords
    adhesives; three-dimensional integrated circuits; wafer bonding; 3D-IC; device processing; high topography substrate; innovative adhesive removal; mechanical wafer debonding; single material temporary bond; three-dimensional integrate circuit; Bonding; Chemicals; Inspection; Silicon; Solvents; Substrates; Surfaces;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
  • Conference_Location
    San Diego, CA
  • Type

    conf

  • DOI
    10.1109/ECTC.2015.7159785
  • Filename
    7159785