Robust Thin-Film Wire-Grid THz Polarizer Fabricated Via a Low-Cost Approach

Author

Huang, Zhe ; Park, Hongkyu ; Parrott, Edward P J ; Chan, Hau Ping ; Pickwell-MacPherson, Emma

Author_Institution

Dept. of Electron. Eng., City Univ. of Hong Kong, Kowloon, China

Volume

25

Issue

1

fYear

2013

fDate

Jan.1, 2013

Firstpage

81

Lastpage

84

Abstract

A robust thin-film wire-grid terahertz (THz) polarizer was fabricated via a low-cost, mass-producible manufacturing approach. This polarizer is built on a very thin silica layer structurally supported by a silicon substrate. In addition, the metal grating is protected by a polymer thin film, which eliminates the multireflection effect and enhances the robustness of the polarizer for easy packaging. The polarizer can be easily mounted onto a Newport rotation holder for immediate use. A THz time-domain spectrometer is used to characterize its performance, and an excellent agreement is found between the FDTD-simulated results and the experimental results. The polarizer offered 20-40 dB and 0.8 dB of extinction ratio and transmission loss over a frequency range of 0.2-2.0 THz, respectively.

Keywords

optical fabrication; silicon; terahertz spectroscopy; terahertz wave devices; Newport rotation holder; easy packaging; extinction ratio; low-cost approach; mass-producible manufacturing approach; metal grating; multireflection effect; polymer thin film; robust thin-film; silicon substrate; transmission loss; very thin silica layer; wire-grid terahertz polarizer fabrication; Metals; Polymers; Robustness; Silicon; Substrates; Time domain analysis; Gratings; optical polarization; polymers; submilimeter wave devices; thin film;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2012.2228184

Filename

6357219