Title :
Three-Dimensional 128 Gb MLC Vertical nand Flash Memory With 24-WL Stacked Layers and 50 MB/s High-Speed Programming
Author :
Ki-Tae Park ; Sangwan Nam ; Daehan Kim ; Pansuk Kwak ; Doosub Lee ; Yoon-He Choi ; Myung-Hoon Choi ; Dong-Hun Kwak ; Doo-Hyun Kim ; Min-Su Kim ; Hyun-Wook Park ; Sang-Won Shim ; Kyung-Min Kang ; Sang-Won Park ; Kangbin Lee ; Hyun-Jun Yoon ; Kuihan Ko ; Sh
Author_Institution :
Flash Design Team, Samsung Electron. Co. Ltd., Hwaseong, South Korea
Abstract :
In this work, we present a true 3D 128 Gb 2 bit/cell vertical-NAND (V-NAND) Flash product for the first time. The use of barrier-engineered materials and gate all-around structure in the 3D V-NAND cell exhibits advantages over 1 × nm planar NAND, such as small Vth shift due to small cell coupling and narrow natural Vth distribution. Also, a negative counter-pulse scheme realizes a tightly programmed cell distribution. In order to reduce the effect of a large WL coupling, a glitch-canceling discharge scheme and a pre-offset control scheme is implemented. Furthermore, an external high-voltage supply scheme along with the proper protection scheme for a high-voltage failure is used to achieve low power consumption. The chip accomplishes 50 MB/s write throughput with 3 K endurance for typical embedded applications. Also, extended endurance of 35 K is achieved with 36 MB/s of write throughput for data center and enterprise SSD applications.
Keywords :
NAND circuits; flash memories; low-power electronics; power consumption; three-dimensional integrated circuits; 24-WL stacked layers; 3D V-NAND flash product; barrier-engineered materials; bit rate 36 Mbit/s; bit rate 50 Mbit/s; cell coupling; data center; enterprise SSD applications; external high-voltage supply scheme; gate all-around structure; glitch-canceling discharge scheme; high-speed programming; high-voltage failure; large WL coupling; low power consumption; narrow natural voltage distribution; negative counter-pulse scheme; planar NAND; pre-offset control scheme; programmed cell distribution; storage capacity 128 Gbit; temperature 3 K; temperature 35 K; three-dimensional MLC vertical NAND flash memory; write throughput; Arrays; Ash; Couplings; Logic gates; Microprocessors; Programming; 3-D vertical-nand flash; External high-voltage supply; WL crosstalk reduction; good endurance; high performance; negative counter-pulse;
Journal_Title :
Solid-State Circuits, IEEE Journal of
DOI :
10.1109/JSSC.2014.2352293