DocumentCode :
725148
Title :
Using fractal dimensions as performance indicators for manufacturing systems
Author :
Grau, Gero ; Pabst, Detlef ; Stehli, Marcel
Author_Institution :
Manuf. Technol., GLOBALFOUNDRIES, Dresden, Germany
fYear :
2015
fDate :
3-6 May 2015
Firstpage :
272
Lastpage :
275
Abstract :
Chaos theory has been a young research field with successful applications to a variety of areas. Even though former publications have assessed the question if production systems behave chaotic, little work has been published on real life production systems, especially about semiconductor manufacturing. This paper applies the concept of fractal dimensions to assess the performance of production toolsets and demonstrates fractal dimension as an alternative for graphical analysis of performance indicators. Two examples illustrate the variety of applications and the capability of fractal dimensions to compare different zoom levels and to be tolerant against patterns in the data.
Keywords :
chaos; fractals; graph theory; semiconductor device manufacture; chaos theory; fractal dimensions; graphical analysis; manufacturing systems; production systems; semiconductor manufacturing; Chaos; Fractals; Manufacturing systems; Semiconductor device measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2015 26th Annual SEMI
Conference_Location :
Saratoga Springs, NY
Type :
conf
DOI :
10.1109/ASMC.2015.7164493
Filename :
7164493
Link To Document :
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