DocumentCode :
726160
Title :
Simple creep parameters extraction in metal contact RF-MEMS switches
Author :
Lemoine, E. ; Pothier, A. ; Crunteanu, A. ; Blondy, P. ; Saillen, N. ; Marchand, L.
Author_Institution :
ESA - ESTEC, Noordwijk, Netherlands
fYear :
2015
fDate :
17-22 May 2015
Firstpage :
1
Lastpage :
4
Abstract :
This paper presents a novel methodology for mechanical creep modeling in RF-MEMS. The devices are held in the down state and a servo loop maintains a constant contact resistance by varying the applied bias voltage. From this down state bias voltage variation, creep parameters, both from mechanical structure and contact area, are extracted. This method can be conducted on packaged commercial devices without needing any specific fabrication. This test can be used for rapid device screening and technology optimization.
Keywords :
contact resistance; microswitches; constant contact resistance; creep parameters extraction; down state bias voltage variation; mechanical creep modeling; metal contact RF-MEMS switches; rapid device screening; technology optimization; Energy measurement; Micromechanical devices; Radio frequency; Reliability theory; Resistance; Strain measurement; Mechanical creep; Ohmic switches; RF-MEMS reliability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium (IMS), 2015 IEEE MTT-S International
Conference_Location :
Phoenix, AZ
Type :
conf
DOI :
10.1109/MWSYM.2015.7167008
Filename :
7167008
Link To Document :
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