DocumentCode :
726459
Title :
Layout-dependent-effects-aware analytical analog placement
Author :
Hung-Chih Ou ; Kai-Han Tseng ; Jhao-Yan Liu ; I-Peng Wu ; Yao-Wen Chang
Author_Institution :
Grad. Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear :
2015
fDate :
8-12 June 2015
Firstpage :
1
Lastpage :
6
Abstract :
Layout-dependent effects (LDEs) have become a critical issue in modern analog and mixed-signal circuit designs. The three major sources of LDEs, well proximity, length of oxide diffusion, and oxide-to-oxide spacing, significantly affect the threshold voltage and mobility of devices. In this paper, we propose the first work to consider the three major sources of LDEs during analog placement. We first transform the three LDE models into nonlinear analytical placement models. Then an LDE-aware analytical analog placement algorithm is presented to mitigate the influence of the LDEs while improving circuit performance. Experimental results show that our placement algorithm can effectively and efficiently reduce the LDE-induced variations and improve circuit performance.
Keywords :
integrated circuit layout; mixed analogue-digital integrated circuits; LDE-aware analytical analog placement algorithm; analog-signal circuit designs; layout-dependent-effects-aware; mixed-signal circuit designs; nonlinear analytical placement models; oxide diffusion length; oxide-to-oxide spacing; Algorithm design and analysis; Analog circuits; Analytical models; Circuit optimization; Routing; Stress; Threshold voltage; Analog ICs; Layout-Dependent Effects; Physical Design; Placement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference (DAC), 2015 52nd ACM/EDAC/IEEE
Conference_Location :
San Francisco, CA
Type :
conf
DOI :
10.1145/2744769.2744865
Filename :
7167374
Link To Document :
بازگشت