DocumentCode :
726614
Title :
A 600V FS-IGBT using locally isolated P-well structures for improved short circuit ruggedness
Author :
Jisun Kim ; Sooseong Kim ; Kwang-Hoon Oh ; Chongman Yun
Author_Institution :
TRinno Technol. Co., Ltd., Anyang, South Korea
fYear :
2015
fDate :
1-5 June 2015
Firstpage :
823
Lastpage :
828
Abstract :
Trench gate field stop (FS) IGBT is widely used in various power applications owing to its low conduction and switching losses. However, the trench gate FS-IGBT induces the high saturation current due to its high cell density so that it deteriorates the short circuit ruggedness, which is essential for the power applications such as welding machines and motor controls. In this paper, a 600V trench gate FS-IGBT having improved short circuit capability is proposed. The proposed IGBT employs locally isolated P-well structure in the active region. Thereby the IGBT shows sufficient short circuit withstanding time with VCE, SAT of 1.5V and EOFF of 25|jJ/A by means of the carrier stored effect.
Keywords :
insulated gate bipolar transistors; short-circuit currents; conduction loss; improved short circuit ruggedness; locally isolated P-well structures; saturation current; switching loss; trench gate FS-IGBT; trench gate field stop; voltage 1.5 V; voltage 600 V; Charge carrier processes; Current density; Insulated gate bipolar transistors; Leakage currents; Logic gates; Switches; Switching loss; Carrier stored effect; Isolated P-well; Short circuit ruggedness; Trench gate FS-IGBT;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Electronics and ECCE Asia (ICPE-ECCE Asia), 2015 9th International Conference on
Conference_Location :
Seoul
Type :
conf
DOI :
10.1109/ICPE.2015.7167877
Filename :
7167877
Link To Document :
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