Title :
All-solid-state electrochromic thin films for optical iris application
Author :
Min-Chuan Wang ; Ming-Hao Hsieh ; Wei-Hsiu Hsu ; Wen-Fa Tsai ; Der-Jun Jan
Author_Institution :
Phys. Div., Inst. of Nucl. Energy Res., Taoyuan, Taiwan
Abstract :
We have successfully developed an all-solid-state electrochromic device (ECD) as the optical iris for a camera lens application. The all-solid-state ECD could potentially control the transmittance from 88.5% to 6.5% at 633nm. The patterned electrochromic solid state device with the one substrate structure of NiO/Ta2O5/WO3 on ITO coated glass was prepared at room temperature by reactive DC magnetron sputtering technique and shadow mask method. With the application of ECDs, it is possible to directly attach the electrochromic optical iris onto a camera lens without any mechanical equipment. Furthermore, the low power consumption of 16.75mW per switching cycle at voltages as low as 5.5 V, make ECDs the ideal components for battery powered mobile applications.
Keywords :
diaphragms; electrochromic devices; integrated optics; integrated optoelectronics; nickel compounds; optical control; optical fabrication; optical films; photographic lenses; sputter deposition; tantalum compounds; tungsten compounds; ECD; ITO coated glass; NO-Ta2O5-WO3-ITO; all-solid-state electrochromic thin films; battery powered mobile applications; camera lens application; optical iris application; patterned electrochromic solid state device; power 16.75 mW; power consumption; reactive DC magnetron sputtering; room temperature; shadow mask method; switching cycle; temperature 293 K to 298 K; transmittance control; voltage 5.5 V; wavelength 633 nm; Cameras; Glass; Indium tin oxide; Iris; Optical films; Substrates;
Conference_Titel :
Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2015 22nd International Workshop on
Conference_Location :
Kyoto
DOI :
10.1109/AM-FPD.2015.7173230