DocumentCode
729233
Title
Materials parameter extraction using analytical models in PCMO based RRAM
Author
Chakraborty, I. ; Singh, A.K. ; Kumbhare, P. ; Panwar, N. ; Ganguly, U.
Author_Institution
Indian Inst. of Technol., Bombay, Mumbai, India
fYear
2015
fDate
21-24 June 2015
Firstpage
87
Lastpage
88
Abstract
In this paper, we have present analytical models based extraction of materials parameters for PCMO based RRAM. Based on a trap-SCLC model, the energy and spatial distribution of trap-density is extracted. A single-level trap energy is estimated. The uniform trap density model provides consistent trap density estimated from low bias Ohmic regime as well as high-bias Trap-Filled Limit regime.
Keywords
calcium compounds; manganese compounds; praseodymium compounds; resistive RAM; silicon compounds; PCMO based RRAM; Pr0.7Ca0.3MnO; SiO2-Si; high-bias trap-filled limit regime; low bias Ohmic regime; materials parameter extraction; single-level trap energy; spatial distribution; trap-SCLC model; trap-density; uniform trap density model; Electrodes; Electrostatics; Numerical analysis; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2015 73rd Annual
Conference_Location
Columbus, OH
Print_ISBN
978-1-4673-8134-5
Type
conf
DOI
10.1109/DRC.2015.7175568
Filename
7175568
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