DocumentCode
729266
Title
Programming protocol optimization for analog weight tuning in resistive memories
Author
Ligang Gao ; Shimeng Yu
Author_Institution
Sch. of Electr., Comput., & Energy Eng., Arizona State Univ., Tempe, AZ, USA
fYear
2015
fDate
21-24 June 2015
Firstpage
184
Lastpage
184
Abstract
Resistive memories (also called memristors) demonstrate attractive features such as excellent scaling prospects, fast switching speed and high retention. In addition, many resistive memories can tune the conductance continuously by applying voltage pulses consecutively (e.g. positive pulses to gradually increase conductance and negative pulses to gradually decrease conductance). Such conductance modulation capability has attracted significant attention to function as synaptic devices for neuro-inspired computing. Recently, F. Alibart, et al. proposed an adaptable variation-tolerant algorithm to tune TiOx based resistive devices to an intermediate state by varying pulse widths and amplitudes. However, the programming protocol in F. Alibart´s approach is not optimized, thus it is time consuming to reach the target conductance. In this work, we propose optimization strategies of programming protocols by adjusting the pulse amplitude incremental steps, the pulse width incremental steps, and the start voltages. We performed the experiments on the HfOx based resistive devices. We identified that the key limiting factor for the tuning convergence speed is the overshoot due to the stochastic nature of the switching dynamics. Therefore, optimizing the incremental steps of voltage carefully to avoid overshoot is critical for fast tuning.
Keywords
hafnium compounds; memristors; optimisation; resistive RAM; titanium compounds; HfOx; TiOx; adaptable variation-tolerant algorithm; analog weight tuning; conductance modulation capability; convergence speed; memristors; negative pulses; programming protocol optimization; pulse amplitude incremental steps; pulse width incremental steps; pulse widths; resistive devices; resistive memories; scaling prospects; start voltages; switching dynamics; switching speed; voltage pulses; Hafnium compounds; Optical switches; Optimization; Programming; Protocols; Tin; Tuning;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2015 73rd Annual
Conference_Location
Columbus, OH
Print_ISBN
978-1-4673-8134-5
Type
conf
DOI
10.1109/DRC.2015.7175619
Filename
7175619
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