DocumentCode :
72945
Title :
Half-MOS Based Single-Poly EEPROM Cell With Program and Erase Bit Granularity
Author :
Torricelli, Fabrizio ; Milani, Lili ; Colalongo, Luigi ; Richelli, Anna ; Kovacs-Vajna, Zsolt Miklos
Author_Institution :
Dept. of Inf. Eng., Univ. of Brescia, Brescia, Italy
Volume :
34
Issue :
12
fYear :
2013
fDate :
Dec. 2013
Firstpage :
1509
Lastpage :
1511
Abstract :
A single-poly electrically erasable programmable ROM (EEPROM) cell compatible with standard CMOS process is proposed. With respect to the classical embedded NOR cell, it can be programmed and erased by Fowler-Nordheim tunneling with single-bit granularity. The memory cell is based on a novel writing-inhibition scheme enabled by the combination of the body effect with multiple half-MOS devices. Experimental results on programming, erasing, inhibition, reading, and cycling endurance are provided using a 0.13 μm standard CMOS process.
Keywords :
CMOS memory circuits; EPROM; Fowler-Nordheim tunneling; body effect combination; classical embedded NOR cell; cycling endurance; half-MOS based single-poly EEPROM cell; memory cell; program-erase bit granularity; single-bit granularity; single-poly electrically erasable programmable ROM cell; size 0.13 mum; standard CMOS process; writing-inhibition scheme; CMOS process; EPROM; Flash memory cells; Threshold voltage; Tunneling; Embedded flash; multiple-time programmable (MTP) memory; single-polysilicon electrically erasable programmable ROM (EEPROM);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2285258
Filename :
6650056
Link To Document :
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