• DocumentCode
    731097
  • Title

    Electrical measurements for the control of nanoparticle growth in an acetylene plasma

  • Author

    von Wahl, Erik ; Kersten, Holger ; Hinz, Alexander ; Strunskus, Thomas

  • Author_Institution
    Inst. of Exp. & Appl. Phys., Christian-Albrechts-Univ. Kiel, Kiel, Germany
  • fYear
    2015
  • fDate
    24-28 May 2015
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Nanoparticles are not only of fundamental interest due to their remarkable properties but also of practicle importance in material processing. Controlling their growth in plasmas is regarded as a new route to prepare nanoparticles of well defined size and composition. However, the processes during their formation are yet to be fully understood. Especially the early stages of the particle growth are not well investigated since they are experimentally inaccessible by standard methods like Mie-scattering. A novel collection method based on neutral drag was tested in order to get a better insight into the early stages of particle growth. The experiments were performed in a capacitively coupled discharge, where multiple growth cycles can be obtained. Size distributions of the nanoparticles at different stages of the growth cycle were determined ex-situ by electron microscopy. The obtained size distributions were correlated with in-situ measurements of the bias voltage and the phase angle between discharge current and voltage. The observed correlations, which can be used for prediction of the particle growth, are qualitatively explained.
  • Keywords
    electron microscopy; nanofabrication; nanoparticles; particle size; plasma materials processing; Mie scattering; acetylene plasma; bias voltage; capacitively coupled discharge; discharge current; electrical measurements; electron microscopy; material processing; multiple growth cycles; nanoparticle growth; neutral drag; particle growth; particle size; phase angle; size distributions; standard methods;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Sciences (ICOPS), 2015 IEEE International Conference on
  • Conference_Location
    Antalya
  • Type

    conf

  • DOI
    10.1109/PLASMA.2015.7179559
  • Filename
    7179559