Synthesis and analysis of titanium nitride thin film in atmospheric thermal plasma torch

Author

Fathi, J. ; Mohsenian, S. ; Shafie, M. ; Mehdikia, H. ; Shokri, B.

Author_Institution

Plasma Eng., Laser & Plasma Instn., Tehran, Iran

fYear

2015

fDate

24-28 May 2015

Firstpage

1

Lastpage

1

Abstract

In this paper, a layer of titanium nitride deposited on titanium substrate. Titanium nitride produced by the reaction of titanium and nitrogen plasma that generated by plasma torch, then molten particles of titanium nitride huddled on to the substrate. Sample produced by this method analyzed with Raman scattering spectroscopy and X-ray Diffraction witch confirm titanium nitride production. Vickers hardness was measured using the layer that was at best 1150 HV0.3. To study the surface of layer, light microscopy and electron microscopy (SEM) and AFM were used.

Keywords

Raman spectra; Vickers hardness; X-ray diffraction; atomic force microscopy; optical microscopy; plasma deposition; plasma torches; scanning electron microscopy; thin films; titanium compounds; AFM; Raman scattering spectroscopy; SEM; Ti; TiN; Vickers hardness; X-ray diffraction; atmospheric thermal plasma torch; electron microscopy; light microscopy; molten particles; titanium nitride deposition; titanium nitride thin film; titanium substrate; titanium-nitrogen plasma reaction; Electron microscopy; Plasmas; Substrates; Thermal analysis; Thermal engineering; Titanium;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Sciences (ICOPS), 2015 IEEE International Conference on

Conference_Location

Antalya

Type

conf

DOI

10.1109/PLASMA.2015.7179696

Filename

7179696