Title :
Reaction of CCl3F (CFC-11) with CH4 in a dielectric barrier discharge reactor
Author :
Kundu, Sazal K. ; Kennedy, Eric M. ; Mackie, John C. ; Molloy, Thomas S. ; Gaikwad, Vaibhav V. ; Dlugogorski, Bogdan Z. ; Holdsworth, Clovia I.
Author_Institution :
Process Safety & Environ. Protection Res. Group, Univ. of Newcastle, Callaghan, NSW, Australia
Abstract :
Summary form only given. The reaction of CCl3F (CFC-11) with CH4 in a non-equilibrium plasma has been examined. CFC-11 has the highest ozone depleting potential (ODP) among all refrigerants used commercially (ODP value of 1) and also has very high global warming potential (GWP) of 4680 and an atmospheric lifetime of 45 years. The manufacture of CFC-11 was banned by the Montreal Protocol in 1996 due to its deleterious effects on Earth´s ozone layer. It is widely recognized that significant quantities of CFC-11 remain in polyurethane foams in discarded refrigerators or refrigerators awaiting disposal. While there are several methods developed to recover CFC-11 from polyurethane foams, a suitable process is required for its disposal. In this study, a dielectric barrier discharge reactor, employing alumina dielectrics (the detail description can be founds in2, 3), has been applied for the conversion of CFC-11 with the aim of synthesizing value-added materials. It has been found that polymers of non-crosslinked architecture can be synthesized from the reaction of CFC-11 and CH4. This work is focused on structural analyses of the polymers as well as discussions on conversion of CFC-11 under various conditions and characterization of the electrical discharge.
Keywords :
alumina; discharges (electric); organic compounds; ozone; plasma chemistry; polymer foams; refrigerants; Al2O3; CFC-11-CH4 reaction; ODP; alumina dielectrics; dielectric barrier discharge reactor; electrical discharge; global warming potential; nonequilibrium plasma; ozone depleting potential; polymer structure; polyurethane foams; refrigerants; refrigerators;
Conference_Titel :
Plasma Sciences (ICOPS), 2015 IEEE International Conference on
Conference_Location :
Antalya
DOI :
10.1109/PLASMA.2015.7179783