Inductively coupled plasma for graphene production

Author

Durmaz, Yakup ; Bozduman, Ferhat ; Koc, I. Umran ; Ismael, Mohammed ; Nore, Sabah ; Gulec, Ali ; Oksuz, Lutfi

Author_Institution

Phys. Dept., Suleyman Demirel Univ., Isparta, Turkey

fYear

2015

fDate

24-28 May 2015

Firstpage

1

Lastpage

1

Abstract

This study is investigating the direct growth of graphene on a membrane filter and a copper surface by injecting ethanol vapor into an inductively coupled plasma (ICP) at atmospheric pressure. Low temperature (<;1000) graphene production is possible by an ICP plasma [1]. The discharge chemical mechanism will be analyzed by optical emission spectrum. The effects of the temperature and the plasma power on graphene sheets will be analyzed by SEM, AFM and Raman spectra.

Keywords

Raman spectra; atomic force microscopy; discharges (electric); graphene; membranes; plasma diagnostics; plasma materials processing; plasma temperature; scanning electron microscopy; AFM; C; Cu; ICP plasma; Raman spectra; SEM; atmospheric pressure; copper surface; discharge chemical mechanism; ethanol vapor injection; graphene direct growth; graphene sheets; inductively coupled plasma; low-temperature graphene production; membrane filter; optical emission spectra; plasma power; pressure 1 atm; temperature effects; Copper; Graphene; Iterative closest point algorithm; Optical filters; Plasma temperature; Production;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Sciences (ICOPS), 2015 IEEE International Conference on

Conference_Location

Antalya

Type

conf

DOI

10.1109/PLASMA.2015.7179803

Filename

7179803