• DocumentCode
    731369
  • Title

    Simulation of nanocolumn formation in a plasma environment

  • Author

    Abraham, Jan Willem ; Strunskus, Thomas ; Faupel, Franz ; Bonitz, Michael

  • Author_Institution
    ITAP, Univ. of Kiel, Kiel, Germany
  • fYear
    2015
  • fDate
    24-28 May 2015
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. Recent experiments and kinetic Monte Carlo (KMC) simulations [1,2] demonstrated that physical vapor codeposition of a metal alloy (Fe-Ni-Co) and a polymer (Teflon AF) can lead to self-organized growth of magnetic nanocolumns. While these experiments have been carried out with thermal sources, we analyze the feasibility of this process for the case of a sputtering source. For that purpose, we extend our previous simulation model by including a process that takes into account the influence of ions impinging on the substrate [3]. The simulation results predict that metal nanocolumn formation should be possible. Furthermore we show that the effect of ions, which create trapping sites for the metal particles, is an increased number of nanocolumns.
  • Keywords
    Monte Carlo methods; ion-surface impact; nanofabrication; nanoparticles; plasma materials processing; self-assembly; sputter deposition; Teflon AF; kinetic Monte Carlo simulations; magnetic nanocolumns; metal alloy; nanocolumn formation; physical vapor codeposition; plasma environment; polymer; self-organized growth; sputtering source; thermal sources; trapping sites; Ions; Kinetic theory; Metals; Monte Carlo methods; Plasmas; Polymers; Thermal analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Sciences (ICOPS), 2015 IEEE International Conference on
  • Conference_Location
    Antalya
  • Type

    conf

  • DOI
    10.1109/PLASMA.2015.7179893
  • Filename
    7179893