DocumentCode
731369
Title
Simulation of nanocolumn formation in a plasma environment
Author
Abraham, Jan Willem ; Strunskus, Thomas ; Faupel, Franz ; Bonitz, Michael
Author_Institution
ITAP, Univ. of Kiel, Kiel, Germany
fYear
2015
fDate
24-28 May 2015
Firstpage
1
Lastpage
1
Abstract
Summary form only given. Recent experiments and kinetic Monte Carlo (KMC) simulations [1,2] demonstrated that physical vapor codeposition of a metal alloy (Fe-Ni-Co) and a polymer (Teflon AF) can lead to self-organized growth of magnetic nanocolumns. While these experiments have been carried out with thermal sources, we analyze the feasibility of this process for the case of a sputtering source. For that purpose, we extend our previous simulation model by including a process that takes into account the influence of ions impinging on the substrate [3]. The simulation results predict that metal nanocolumn formation should be possible. Furthermore we show that the effect of ions, which create trapping sites for the metal particles, is an increased number of nanocolumns.
Keywords
Monte Carlo methods; ion-surface impact; nanofabrication; nanoparticles; plasma materials processing; self-assembly; sputter deposition; Teflon AF; kinetic Monte Carlo simulations; magnetic nanocolumns; metal alloy; nanocolumn formation; physical vapor codeposition; plasma environment; polymer; self-organized growth; sputtering source; thermal sources; trapping sites; Ions; Kinetic theory; Metals; Monte Carlo methods; Plasmas; Polymers; Thermal analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Sciences (ICOPS), 2015 IEEE International Conference on
Conference_Location
Antalya
Type
conf
DOI
10.1109/PLASMA.2015.7179893
Filename
7179893
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