Title :
Infrared spectroscopy of CH4/N2 and C2HM/N2 (M=2,4,6) gas mixtures and deposition of nitrogen-containing polymer films in a dielectric barrier discharge
Author :
Thejaswini, H.C. ; Sushkov, V. ; Hippler, R.
Author_Institution :
Mech. & Aerosp. Eng., Case Western Reserve Univ., Cleveland, OH, USA
Abstract :
Fourier transform infrared spectroscopy of CH4/N2 and C2Hm/N2 (m = 2, 4, 6) gas mixtures in a medium pressure (300 mbar) dielectric barrier discharge was performed. Consumption of the initial gas and formation of other hydrocarbon and of nitrogen-containing HCN and NH3 molecules was observed. NH3 formation was further confirmed by laser absorption measurements. The experimental result for NH3 is at variance with simulation results.
Keywords :
Fourier transform infrared spectra; X-ray photoelectron spectra; extinction coefficients; polymer films; refractive index; thin films; vacuum deposition; C2HM-N2 gas mixtures; CH4-N2 gas mixtures; FTIR; Fourier transform infrared spectroscopy; N-C ratio; N2; Si; Si(100) surface; SiO2-Al; X-ray photoelectron spectroscopy; aluminum coated glass substrates; chemical compositions; dielectric barrier discharge; extinction coefficient; functional groups; hydrocarbon; initial gas consumption; laser absorption measurements; nitrogen-containing HCN molecules; nitrogen-containing NH3 molecules; nitrogen-containing polymer film deposition; pressure 300 mbar; refractive index; saturated alkyl groups; spectroscopic ellipsometry; thin films; unsaturated alkyl groups; Aerospace engineering; Discharges (electric); Fourier transform infrared spectroscopy; Nitrogen; Physics; Polymer films;
Conference_Titel :
Plasma Sciences (ICOPS), 2015 IEEE International Conference on
Conference_Location :
Antalya
DOI :
10.1109/PLASMA.2015.7179963
