Infrared spectroscopy of CH4/N2 and C2HM/N2 (M=2,4,6) gas mixtures and deposition of nitrogen-containing polymer films in a dielectric barrier discharge

Author

Thejaswini, H.C. ; Sushkov, V. ; Hippler, R.

Author_Institution

Mech. & Aerosp. Eng., Case Western Reserve Univ., Cleveland, OH, USA

fYear

2015

fDate

24-28 May 2015

Firstpage

1

Lastpage

1

Abstract

Fourier transform infrared spectroscopy of CH₄/N₂ and C₂H_m/N₂ (m = 2, 4, 6) gas mixtures in a medium pressure (300 mbar) dielectric barrier discharge was performed. Consumption of the initial gas and formation of other hydrocarbon and of nitrogen-containing HCN and NH₃ molecules was observed. NH₃ formation was further confirmed by laser absorption measurements. The experimental result for NH₃ is at variance with simulation results.

Keywords

Fourier transform infrared spectra; X-ray photoelectron spectra; extinction coefficients; polymer films; refractive index; thin films; vacuum deposition; C₂H_M-N₂ gas mixtures; CH₄-N₂ gas mixtures; FTIR; Fourier transform infrared spectroscopy; N-C ratio; N₂; Si; Si(100) surface; SiO₂-Al; X-ray photoelectron spectroscopy; aluminum coated glass substrates; chemical compositions; dielectric barrier discharge; extinction coefficient; functional groups; hydrocarbon; initial gas consumption; laser absorption measurements; nitrogen-containing HCN molecules; nitrogen-containing NH₃ molecules; nitrogen-containing polymer film deposition; pressure 300 mbar; refractive index; saturated alkyl groups; spectroscopic ellipsometry; thin films; unsaturated alkyl groups; Aerospace engineering; Discharges (electric); Fourier transform infrared spectroscopy; Nitrogen; Physics; Polymer films;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Sciences (ICOPS), 2015 IEEE International Conference on

Conference_Location

Antalya

Type

conf

DOI

10.1109/PLASMA.2015.7179963

Filename

7179963