Structural and electrical characterization of magnetron sputtered MoOX thin films

Author

Ghorannevis, Z. ; Akbarnejad, E. ; Ghoranneviss, M.

Author_Institution

Dept. of Phys., Islamic Azad Univ., Karaj, Iran

fYear

2015

fDate

24-28 May 2015

Firstpage

1

Lastpage

1

Abstract

Molybdenum thin films are widely used for photovoltaic cells and thin film transistor liquid crystal displays (TFT-LCD) due to their relatively low electrical resistance and easy chemical patterning. In this study thin films of molybdenum oxide were deposited on glass and crystalline silicon substrates using Magnetron sputtering method by sputtering of molybdenum target in the presence of oxygen and argon gas mixture. The effect of oxygen partial pressure of Ar/Oxygen on the structure, optical and electrical properties of the films was systematically studied.

Keywords

electric resistance; electrical resistivity; molybdenum compounds; sputter deposition; thin films; MoO_x; chemical patterning; crystalline silicon substrates; electrical properties; electrical resistance; glass substrates; magnetron sputtering; molybdenum oxide thin films; optical properties; oxygen partial pressure effect; oxygen-argon gas mixture; photovoltaic cells; structural properties; thin film transistor liquid crystal displays; Argon; Magnetic films; Photovoltaic cells; Physics; Sputtering; Thin film transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Sciences (ICOPS), 2015 IEEE International Conference on

Conference_Location

Antalya

Type

conf

DOI

10.1109/PLASMA.2015.7179971

Filename

7179971