Generation of low-temperature atmospheric pressure plasma-jet patternable array at a 320µm pitch channel array

In this paper, a novel device to create patternable atmospheric-pressure plasma-jet array at a fine-pitch (320μm) is newly developed, and the evaluation results of the fabricated devices are reported for the first time. Micro plasma jet array are created by multi-channel gas discharges individually in microfluidic channels on a silicon chip, and high density of sub-mm pitch plasma jet array is realized in this study. Also, different kinds of plasma-jet can be created at a very close distance. Two different kinds of plasma-jet have been generated at a 320μm distance. Combining reactive gases for plasma creation, micro-scale reaction for material deposition, etching, and surface treatment can be realized. As a demonstration of plasma irradiation, photoresist sample was exposed to two plasma jets, and 1.0μm/min etching rate was obtained at a 30mW power.