DocumentCode
732465
Title
Excimer laser annealing for LTPS on large glass substrates
Author
Paetzel, Rainer
Author_Institution
Coherent LaserSystems GmbH & Co. KG, Goettingen, Germany
fYear
2015
fDate
10-15 May 2015
Firstpage
1
Lastpage
2
Abstract
Low-Temperature Polycrystalline Silicon (LTPS) is the enabling backplane technology for AMOLED displays and small to medium sized high-resolution AMLCDs. Progress on Excimer Laser Annealing towards large-scale production of LTPS is described.
Keywords
LED displays; excimer lasers; laser beam annealing; silicon; AMOLED displays; LTPS; backplane technology; excimer laser annealing; glass substrates; high-resolution AMLCD; large-scale production; low-temperature polycrystalline silicon; Annealing; Circuit stability; Laser beams; Laser stability; Optical beams; Oscillators; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2015 Conference on
Conference_Location
San Jose, CA
Type
conf
Filename
7182896
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