DocumentCode :
732960
Title :
Active epsilon-near-zero infrared metamaterials
Author :
Arju, Nihal ; Ma, Tzuhsuan ; Trendafilov, Simeon ; Jongwon Lee ; Belkin, Mikhail ; Shvets, Gennady
Author_Institution :
Dept. of Phys., Univ. of Texas at Austin, Austin, TX, USA
fYear :
2015
fDate :
10-15 May 2015
Firstpage :
1
Lastpage :
2
Abstract :
Metal-insulator-metal based epsilon-near-zero (ENZ) metamaterials are shown to support optical modes localized in the vicinity of a polarizable defect. ENZ-based infrared absorbers are fabricated using SiC and electrically controlled quantum wells structures.
Keywords :
MIM structures; infrared spectra; light polarisation; optical fabrication; optical metamaterials; quantum wells; ENZ-based infrared absorbers; SiC; electrically controlled quantum well structures; metal-insulator-metal based epsilon-near-zero infrared metamaterials; optical mode localization; polarizable defect; silicon carbide fabrication; Magnetic moments; Magnetic separation; Optical device fabrication; Optical polarization; Optical scattering; Optical waveguides; Quantum well devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2015 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
7183397
Link To Document :
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