DocumentCode
732960
Title
Active epsilon-near-zero infrared metamaterials
Author
Arju, Nihal ; Ma, Tzuhsuan ; Trendafilov, Simeon ; Jongwon Lee ; Belkin, Mikhail ; Shvets, Gennady
Author_Institution
Dept. of Phys., Univ. of Texas at Austin, Austin, TX, USA
fYear
2015
fDate
10-15 May 2015
Firstpage
1
Lastpage
2
Abstract
Metal-insulator-metal based epsilon-near-zero (ENZ) metamaterials are shown to support optical modes localized in the vicinity of a polarizable defect. ENZ-based infrared absorbers are fabricated using SiC and electrically controlled quantum wells structures.
Keywords
MIM structures; infrared spectra; light polarisation; optical fabrication; optical metamaterials; quantum wells; ENZ-based infrared absorbers; SiC; electrically controlled quantum well structures; metal-insulator-metal based epsilon-near-zero infrared metamaterials; optical mode localization; polarizable defect; silicon carbide fabrication; Magnetic moments; Magnetic separation; Optical device fabrication; Optical polarization; Optical scattering; Optical waveguides; Quantum well devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2015 Conference on
Conference_Location
San Jose, CA
Type
conf
Filename
7183397
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