DocumentCode :
733332
Title :
Polarization sensitive printing by ultrafast laser nanostructuring in amorphous silicon
Author :
Drevinskas, Rokas ; Beresna, Martynas ; Gecevicius, Mindaugas ; Khenkin, Mark ; Kazanskii, Andrey G. ; Konkov, Oleg I. ; Kazansky, Peter G.
Author_Institution :
Optoelectron. Res. Centre, Univ. of Southampton, Southampton, UK
fYear :
2015
fDate :
10-15 May 2015
Firstpage :
1
Lastpage :
2
Abstract :
We demonstrate femto- and picosecond laser assisted nanostructuring of hydrogenated amorphous silicon (a-Si:H). The laser-induced periodic sub-wavelength structures exhibit the dichroism and giant form birefringence giving extra dimensions to the polarization sensitive image recording.
Keywords :
amorphous semiconductors; birefringence; dichroism; elemental semiconductors; high-speed optical techniques; hydrogen; laser materials processing; light polarisation; nanofabrication; nanophotonics; optical images; printing; silicon; Si:H; amorphous silicon; dichroism; femtosecond laser assisted nanostructuring; giant form birefringence; hydrogenated amorphous silicon; laser-induced periodic sub-wavelength structures; picosecond laser assisted nanostructuring; polarization sensitive image recording; polarization sensitive printing; ultrafast laser nanostructuring; Optical films; Optical imaging; Optical polarization; Optical pulses; Optical sensors; Ultrafast optics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2015 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
7183770
Link To Document :
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