DocumentCode
733528
Title
Extremely low-loss chalcogenide photonics devices with chlorine-based plasma etching
Author
Chiles, Jeff ; Malinowski, Marcin ; Rao, Ashutosh ; Novak, Spencer ; Richardson, Kathleen ; Fathpour, Sasan
Author_Institution
Coll. of Opt. & Photonics, Univ. of Central Florida, Orlando, FL, USA
fYear
2015
fDate
10-15 May 2015
Firstpage
1
Lastpage
2
Abstract
Chlorine-based plasma is employed to produce extremely low propagation loss as low as 0.42 dB/cm in chalcogenide waveguides, record-high intrinsic Q-factors of 450,000 microring resonators and fiber-to-waveguide grating couplers with a coupling efficiency of 37%.
Keywords
Q-factor; chalcogenide glasses; chlorine; diffraction gratings; integrated optics; micro-optics; microcavities; optical fibre couplers; optical glass; optical losses; sputter etching; Cl; chlorine-based plasma etching; extremely low-loss chalcogenide photonic devices; extremely low-loss chalcogenide waveguides; fiber-to-waveguide grating couplers; microring resonators; record-high intrinsic Q-factors; Etching; Films; Glass; Optical ring resonators; Optical waveguides; Photonics; Propagation losses;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2015 Conference on
Conference_Location
San Jose, CA
Type
conf
Filename
7183968
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