DocumentCode :
733537
Title :
High-resolution sub-surface microscopy of CMOS integrated circuits using radially polarized light
Author :
Rutkauskas, M. ; Farrell, C. ; Dorrer, C. ; Marshall, K.L. ; Lundquist, T.R. ; Vedagarbha, P. ; Reid, D.T.
Author_Institution :
Inst. of Photonics & Quantum Sci., Heriot-Watt Univ., Edinburgh, UK
fYear :
2015
fDate :
10-15 May 2015
Firstpage :
1
Lastpage :
2
Abstract :
Comparison of high-resolution sub-surface microscopy shows that illumination with linear polarization resolves an edge with resolutions of 95 nm and 120 nm, depending on E-field orientation, while radial polarization achieves a resolution of 98 nm.
Keywords :
CMOS integrated circuits; integrated optoelectronics; light polarisation; CMOS integrated circuits; E-field orientation; high-resolution subsurface microscopy; linear polarization; radially polarized light; Fingers; Laser beams; Microscopy; Silicon; Spatial resolution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2015 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
7183977
Link To Document :
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