Title :
Improvement of silicon dioxide ridge waveguides using low temperature thermal annealing
Author :
Parks, J.W. ; Cai, H. ; Wall, T. ; Stott, M. ; Hamilton, E. ; Chu, R. ; Hawkins, A.R. ; Schmidt, H.
Author_Institution :
Sch. of Eng., Univ. of California, Santa Cruz, Santa Cruz, CA, USA
Abstract :
Penetration of liquids into SiO2 ridge waveguides during standard processing steps is shown to cause poor mode confinement and increased loss. Thermal annealing repeatedly restores a core with uniform index and low-loss mode confinement.
Keywords :
annealing; optical losses; optical waveguides; refractive index; ridge waveguides; silicon compounds; SiO2; low temperature thermal annealing; low-loss mode confinement; refractive index; silicon dioxide ridge waveguides; Annealing; Indexes; Liquid waveguides; Liquids; Optical waveguides; Semiconductor waveguides; Silicon compounds;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2015 Conference on
Conference_Location :
San Jose, CA
