Title :
Super-resolution optical nanolithography: Beyond the far-field diffraction limit
Author :
Majumder, Apratim ; Masid, Farhana ; Pollock, Benjamin ; Andrew, Trisha L. ; Menon, Rajesh
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Utah, Salt Lake City, UT, USA
Abstract :
We report on overcoming the far-field diffraction limit using an approach that we call Absorbance Modulation Optical Lithography (AMOL).
Keywords :
light absorption; light diffraction; nanolithography; nanophotonics; optical design techniques; optical fabrication; optical limiters; optical modulation; photolithography; absorbance modulation optical lithography; far-field diffraction limit; super-resolution optical nanolithography; Diffraction; Lithography; Optical device fabrication; Optical diffraction; Optical modulation; Resists;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2015 Conference on
Conference_Location :
San Jose, CA
