DocumentCode :
733811
Title :
Near field optical measurements of silicon waveguide in mid-IR regime using scanning thermal microscopy
Author :
Grajower, Meir ; Sebbag, Yoel ; Naiman, Alex ; Desiatov, Boris ; Levy, Uriel
Author_Institution :
Dept. of Appl. Phys., Hebrew Univ. of Jerusalem, Jerusalem, Israel
fYear :
2015
fDate :
10-15 May 2015
Firstpage :
1
Lastpage :
2
Abstract :
We observe for the first time the near field optical intensity distribution of silicon nanophotonic devices operating in the mid-IR spectrum using our scanning thermal microscopy and demonstrate its advantages over conventional NSOM technique.
Keywords :
elemental semiconductors; integrated optics; nanophotonics; near-field scanning optical microscopy; optical waveguides; silicon; NSOM; Si; mid-IR regime; near field optical intensity distribution; near field optical measurements; scanning thermal microscopy; silicon nanophotonic devices; silicon waveguide; Fiber nonlinear optics; Nanoscale devices; Optical imaging; Optical variables measurement; Optical waveguides; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2015 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
7184253
Link To Document :
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