• DocumentCode
    733811
  • Title

    Near field optical measurements of silicon waveguide in mid-IR regime using scanning thermal microscopy

  • Author

    Grajower, Meir ; Sebbag, Yoel ; Naiman, Alex ; Desiatov, Boris ; Levy, Uriel

  • Author_Institution
    Dept. of Appl. Phys., Hebrew Univ. of Jerusalem, Jerusalem, Israel
  • fYear
    2015
  • fDate
    10-15 May 2015
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We observe for the first time the near field optical intensity distribution of silicon nanophotonic devices operating in the mid-IR spectrum using our scanning thermal microscopy and demonstrate its advantages over conventional NSOM technique.
  • Keywords
    elemental semiconductors; integrated optics; nanophotonics; near-field scanning optical microscopy; optical waveguides; silicon; NSOM; Si; mid-IR regime; near field optical intensity distribution; near field optical measurements; scanning thermal microscopy; silicon nanophotonic devices; silicon waveguide; Fiber nonlinear optics; Nanoscale devices; Optical imaging; Optical variables measurement; Optical waveguides; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2015 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    7184253