Title :
Investigation and Comparison of the GaN-Based Light-Emitting Diodes Grown on High Aspect Ratio Nano-Cone and General Micro-Cone Patterned Sapphire Substrate
Author :
Jhih-Kai Huang ; Da-Wei Lin ; Min-Hsiung Shih ; Kang-Yuan Lee ; Jyun-Rong Chen ; Hung-Weng Huang ; Shou-Yi Kuo ; Chung-Hsiang Lin ; Po-Tsung Lee ; Gou-Chung Chi ; Hao-Chung Kuo
Author_Institution :
Dept. of Photonics, Nat. Chiao Tung Univ., Hsinchu, Taiwan
Abstract :
In this paper, we demonstrated the high performance GaN-based LEDs by using a high aspect ratio cone-shape nano-patterned sapphire substrate (HAR-NPSS). We utilized nano-imprint lithography (NIL) and dry-etching system to fabricate a high depth HAR-NPSS. The micro-scale patterned sapphire substrate (PSS) was also used for comparison. A great enhancement of light output was observed when GaN-based LEDs were grown on a HAR-NPSS or a PSS. The light output power of LEDs with a HAR-NPSS and LEDs with a PSS were enhanced of 49 and 38% compared to LEDs with a unpatterned sapphire substrate. The high output power of the LED with a HAR-NPSS indicated that the technology of NAR-NPSS not only can improve the crystalline quality of GaN-based LEDs but also a promising development to a NPSS.
Keywords :
III-V semiconductors; etching; gallium compounds; light emitting diodes; nanolithography; soft lithography; wide band gap semiconductors; Al2O3; GaN; dry etching system; general microcone patterned substrate; high aspect ratio nanocone; light emitting diode; microscale patterned sapphire substrate; nanoimprint lithography; Educational institutions; Epitaxial growth; Gallium nitride; Light emitting diodes; Photonics; Power generation; Substrates; GaN; light-emitting diodes (LEDs); nano-imprint lithography (NIL); nano-patterned sapphire substrate (NPSS);
Journal_Title :
Display Technology, Journal of
DOI :
10.1109/JDT.2013.2270276