DocumentCode :
738123
Title :
TCAD Simulation Study of the Single-Event Effects in Silicon Nanowire Transistors
Author :
Biwei Liu ; Fanyu Liu
Author_Institution :
Nat. Univ. of Defense Technol., Changsha, China
Volume :
15
Issue :
3
fYear :
2015
Firstpage :
410
Lastpage :
416
Abstract :
Three-dimensional TCAD device simulation is carried out to study single-event effects in silicon nanowire devices. The results show that charge collection appears in silicon nanowire devices following the incidence of heavy ions, which is similar to what is observed in a traditional MOSFET. The charge collection mechanism is analyzed in detail. We find that a significant amplification bipolar effect exists in the charge collection process, enhancing the charge collection manifold. The effects of the doping type and the channel length on the charge collection are studied, and the charge collection is compared with that in bulk CMOS transistors. Furthermore, single-event responses are studied in an inverter consisting of nanowire transistors.
Keywords :
MOSFET; elemental semiconductors; invertors; nanowires; semiconductor device models; semiconductor doping; silicon; technology CAD (electronics); MOSFET; Si; amplification bipolar effect; channel length; charge collection; doping type; heavy ions; inverter; silicon nanowire transistors; single event effects; single event response; three-dimensional TCAD device simulation; Electric potential; Logic gates; MOSFET; Nanoscale devices; Semiconductor process modeling; Silicon; Charge collection; Si Nanowire Transistor; Si nanowire transistor; Single Event Effect; single event effect;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2015.2456036
Filename :
7155560
Link To Document :
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