Title :
200 V Superjunction N-Type Lateral Insulated-Gate Bipolar Transistor With Improved Latch-Up Characteristics
Author :
Tee, E. Kho Ching ; Antoniou, M. ; Udrea, F. ; Holke, A. ; Pilkington, S.J. ; Pal, D.K. ; Yew, N.L. ; Abidin, W.A.B.W.Z.
Author_Institution :
X-FAB Sarawak Sdn. Bhd, Kuching, Malaysia
Abstract :
This paper evaluates the technique used to improve the latching characteristics of the 200 V n-type superjunction (SJ) lateral insulated-gate bipolar transistor (LIGBT) on a partial silicon-on-insulator. SJ IGBT devices are more prone to latch-up than standard IGBTs due to the presence of a strong pnp transistor with the p layer serving as an effective collector of holes. The initial SJ LIGBT design latches at about 23 V with a gate voltage of 5 V with a forward voltage drop (VON) of 2 V at 300 A/cm2. The latch-up current density is 1100 A/cm2. The latest SJ LIGBT design shows an increase in latch-up voltage close to 100 V without a significant penalty in VON. The latest design shows a latch-up current density of 1195 A/cm2. The enhanced robustness against static latch-up leads to a better forward bias safe operating area.
Keywords :
current density; insulated gate bipolar transistors; silicon-on-insulator; SJ IGBT devices; SJ LIGBT design; Si; forward bias safe operating area; latch-up characteristics; latch-up current density; latch-up voltage; latching characteristics; partial silicon-on-insulator; static latch-up; strong pnp transistor; superjunction N-type lateral insulated-gate bipolar transistor; voltage 2 V; voltage 200 V; voltage 5 V; Anodes; Insulated gate bipolar transistors; Logic gates; Silicon-on-insulator; Thyristors; Transistors; Voltage measurement; Latch-up; lateral insulated-gate bipolar transistor (LIGBT); partial silicon-on-insulator (SOI); superjunction;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2013.2246165