DocumentCode :
738763
Title :
A Tunnel Dielectric-Based Tunnel FET
Author :
Zhijiong Luo ; Hefei Wang ; Ning An ; Zhengyong Zhu
Author_Institution :
Inst. of Microelectron., Beijing, China
Volume :
36
Issue :
9
fYear :
2015
Firstpage :
966
Lastpage :
968
Abstract :
In this letter, for the first time, we proposed and demonstrated a novel tunnel dielectric-based tunnel FET (TD-TFET). Instead of using semiconductor band-to-band tunneling currents to form drive currents as in normal TFET, tunneling currents through ultrathin dielectric form the drive currents in the TD-TFET. The fabricated devices have achieved 55-mV/decade SS, which breaks the 60-mV/decade SS barrier. It has also realized higher than 1 × 105 ION/IOFF ratio. The unwanted ambipolar effect is greatly reduced, and OFF currents can be lowered to 1 × 10-14 A/μm level. These promising device characteristics make this novel TD-TFET very attractive for the future low standby power applications.
Keywords :
dielectric devices; field effect transistors; tunnel transistors; ambipolar effect; semiconductor band-to-band tunneling currents; tunnel dielectric-based tunnel FET; ultrathin dielectric; Dielectrics; Field effect transistors; Logic gates; Schottky diodes; Silicon; Tunneling; TD-TFET; TFET; ambipolar effects; subthreshold swing; tunnel dielectric layer;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2015.2458932
Filename :
7163532
Link To Document :
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