DocumentCode :
740211
Title :
Write and Erase Threshold Voltage Interdependence in Resistive Switching Memory Cells
Author :
Ghosh, Gargi ; Orlowski, Marius K.
Author_Institution :
Bradley Dept. of Electr. & Comput. Eng., Virginia Polytech. Inst. & State Univ., Blacksburg, VA, USA
Volume :
62
Issue :
9
fYear :
2015
Firstpage :
2850
Lastpage :
2856
Abstract :
A statistical dependence of set voltage Vset on the preceding reset voltage Vreset is observed in resistive memory arrays and explained in terms of two interlocking mechanisms. This dependence can be replicated on a single device by intentionally varying Vreset values by various linear voltage ramp rates. The latter mechanism is well modeled under the assumption that a critical heat deposited locally in the filament triggers the rupture of the filament. Mechanisms are proposed to explain the impact of different ramp rates of the reset operation on the ruptured gap in the filament that affect, in turn, the Vset value of the subsequent set operation. Based on these observations, a one-time tightening procedure is designed, leading to tightened Vset and Vreset distributions.
Keywords :
resistive RAM; statistical analysis; write-once storage; critical heat; erase threshold voltage interdependence; filament rupture; filament triggers; interlocking mechanisms; linear voltage ramp rates; one-time tightening procedure; reset voltage; resistive memory arrays; resistive switching memory cells; statistical dependence; subsequent set operation; write threshold voltage interdependence; Electrodes; Heating; Ions; Random access memory; Resistance; Switches; Threshold voltage; Conductive filament (CF); resistive switch; threshold voltage distributions; threshold voltage distributions.;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2452411
Filename :
7202886
Link To Document :
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