DocumentCode :
741230
Title :
Propagation of Brush-Shaped He/O2 Plasma Plumes in Ambient Air
Author :
Jinhai Niu ; Dongping Liu ; Longfei Ji ; Yang Xia ; Zhenhua Bi ; Ying Song ; Yuan Ma ; Yuan Huang ; Wenchao Wang ; Wenshu Yang
Author_Institution :
Sch. of Phys. & Mater. Eng., Dalian Nat. Univ., Dalian, China
Volume :
43
Issue :
6
fYear :
2015
fDate :
6/1/2015 12:00:00 AM
Firstpage :
1993
Lastpage :
1998
Abstract :
In this paper, we report on the propagation behavior of the atmospheric-pressure and brush-shaped He/O2 plasma plumes generated by a specially designed plasma device. The measurements show that the frequency of applied voltage (f) and the O2 fraction and flow rate of the feed gas significantly affect the discharge propagation of the atmospheric-pressure plasma plume in ambient air. The uniformity of the brush-shaped plasma plume is greatly improved at a relatively high f or He/O2 flow rate. Addition of a trace amount of O2 into the He gas can also contribute to the formation of uniform and brush-shaped plasma plumes in ambient air. This paper confirms that the plasma device composed of well-aligned and micrometer-thick fibers can be utilized to generate large-scale plasma plumes for potential applications. The propagation of the He/O2 plasma plume in ambient air results from the applied electric field across the small gas spacing of a barrier discharge electrode configuration, where the He atoms are easily ionized or excited for generating the brush-shaped plasma.
Keywords :
discharges (electric); helium; oxygen; plasma flow; plasma sources; He-O2; ambient air; barrier discharge electrode configuration; brush-shaped helium-oxygen plasma flow rate; brush-shaped helium-oxygen plasma plume generation; brush-shaped helium-oxygen plasma plume propagation; electric field; micrometer-thick fibers; pressure 1 atm; Atmospheric-pressure plasmas; Current measurement; Discharges (electric); Electrodes; Plasma devices; Plasma measurements; Atmospheric plasma; brush-shaped plasma; discharge propagation; glow discharge; intensified charge-coupled device (ICCD); intensified charge-coupled device (ICCD).;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2015.2424072
Filename :
7098415
Link To Document :
بازگشت