DocumentCode
741354
Title
Breakthroughs for 650-V GaN Power Devices: Stable high-temperature operations and avalanche capability
Author
Liu, Charlie ; Salih, Ali ; Padmanabhan, Balaji ; Jeon, Woochul ; Moens, Peter ; Tack, Marnix ; De Backer, Eddy
Author_Institution
ON Semiconductor, Phoenix, Arizona USA
Volume
2
Issue
3
fYear
2015
Firstpage
44
Lastpage
50
Abstract
Many prior publications have focused on gallium nitride (GaN) dynamic Rdson issues at room temperature, even though GaN power devices have tremendous advantages over silicon (Si) when serving at high temperatures. We show that room-temperature stable dynamic Rdson behavior does not guarantee device reliability, and it is the stable high-temperature dynamic Rdson that determines the ruggedness of the GaN power devices. With our proprietary and innovative designs and optimizations of epitaxial and device structures, we show a completely different dynamic Rdson behavior in contrast to the common trend reported in the literature: a negative dynamic Rdson trend. We demonstrate robust performance and reliability of our new cascode GaN power devices in PFC tests conducted at both room and high temperatures, at high powers, at high-frequency conditions, and in a totem-pole circuit. We speculate on a physical model to explain the observed dynamic Rdson behaviors in terms of trapping, detrapping, and back-gating effects.
Keywords
Epitaxial growth; Gallium nitride; HEMTs; MODFETs; Performance evaluation;
fLanguage
English
Journal_Title
Power Electronics Magazine, IEEE
Publisher
ieee
ISSN
2329-9207
Type
jour
DOI
10.1109/MPEL.2015.2447671
Filename
7240087
Link To Document