Title :
Inverse-Tapered p-Waveguide for Vertical Hole Transport in High-[Al] AlGaN Emitters
Author :
Yuh-Shiuan Liu ; Tsung-Ting Kao ; Satter, Mahbub ; Lochner, Zachary ; Shyh-Chiang Shen ; Detchprohm, Theeradetch ; Yoder, P. Douglas ; Dupuis, Russell D. ; Jae-Hyun Ryou ; Fischer, Alec M. ; Wei, Yong O. ; Hongen Xie ; Ponce, Fernando A.
Author_Institution :
Center for Compound Semicond., Georgia Inst. of Technol., Atlanta, GA, USA
Abstract :
We report a high-aluminum-containing ([Al] ~ 0.6) AlGaN multiple-quantum well (MQW) double-heterojunction (DH) emitter employing an inverse-tapered-composition AlGaN:Mg p-type waveguide grown on a c plane Al-polar AlN bulk substrate. Using numerical simulations, we have determined that the inverse-tapered p-type waveguide design is necessary for high [Al] containing p-n junction devices as any valence band discontinuity at the junction will limit the vertical hole transport and induce a larger voltage-drop across the structure. The fabricated ultraviolet MQW DH emitter can sustain a DC current of at least 500 mA and a pulsed current of at least 1.07 A, which corresponds to a current density of 10 and 18 kA/cm2 at maximum measured voltage of 15 and 20 V with the measured series resistance of 15 and 11 Ω, respectively.
Keywords :
III-V semiconductors; aluminium compounds; current density; gallium compounds; integrated optoelectronics; magnesium; optical design techniques; p-n heterojunctions; quantum well lasers; valence bands; waveguide lasers; AlGaN:Mg; DC current; MQW DH; current density; high-[Al] AlGaN emitters; inverse-tapered p-waveguide design; multiple quantum well double-heterojunction emitter; p-n junction devices; pulsed current; resistance 11 nohm; resistance 15 ohm; valence band discontinuity; vertical hole transport; voltage 15 V; voltage 20 V; voltage drop; Aluminum gallium nitride; Aluminum nitride; Current measurement; III-V semiconductor materials; Physics; Substrates; Wide band gap semiconductors; AlGaN active layer; AlN substrate; Deep ultraviolet laser diodes; Epitaxial growth; deep ultraviolet laser diodes; epitaxial growth;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2015.2443053