DocumentCode :
744288
Title :
UV-C Lasing From AlGaN Multiple Quantum Wells on Different Types of AlN/Sapphire Templates
Author :
Jeschke, Joerg ; Martens, Martin ; Knauer, Arne ; Kueller, Viola ; Zeimer, Ute ; Netzel, Carsten ; Kuhn, Christian ; Krueger, Felix ; Reich, Christoph ; Wernicke, Tim ; Kneissl, Michael ; Weyers, Markus
Author_Institution :
Ferdinand-Braun-Inst., Leibniz-Inst. fur Hochstfrequenztechnik, Berlin, Germany
Volume :
27
Issue :
18
fYear :
2015
Firstpage :
1969
Lastpage :
1972
Abstract :
AlGaN multiple quantum well lasers for optical pumping have been grown by metal-organic vapor phase epitaxy on high and low dislocation density AlN/sapphire templates. Lasers on planar templates exhibited high dislocation densities and high V-pit densities, but a smooth surface morphology leading to inefficient, but laterally very homogeneous optical emission. Lasing was not observed when optically pumped with up to 50 MW/cm2. Epitaxially laterally overgrown templates on patterned sapphire showed much lower dislocation densities, but also step bunching on the surface. This resulted in good photoluminescence efficiencies of up to 20%, but also in a higher lateral inhomogeneity of the emission. Lasers on these templates exhibited lasing at ~240 nm with low full-width at half-maximum of 1 nm and threshold power densities of 11-15 MW/cm2.
Keywords :
III-V semiconductors; MOCVD; aluminium compounds; dislocation density; gallium compounds; optical pumping; photoluminescence; quantum well lasers; surface morphology; vapour phase epitaxial growth; wide band gap semiconductors; AlGaN; AlN-Al2O3; UV-C Lasing; V-pit density; epitaxially laterally overgrown templates; full-width at half-maximum; high dislocation density AlN-sapphire templates; homogeneous optical emission; lateral inhomogeneity; low dislocation density AlN-sapphire templates; metal-organic vapor phase epitaxy; multiple quantum well lasers; optical pumping; patterned sapphire; photoluminescence efficiency; planar templates; step bunching; surface morphology; threshold power density; Aluminum gallium nitride; Aluminum nitride; III-V semiconductor materials; Laser excitation; Surface emitting lasers; Surface morphology; Wide band gap semiconductors; AlGaN; epitaxial lateral overgrowth; lasers; sapphire substrates; ultraviolet;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2015.2448127
Filename :
7130576
Link To Document :
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