• DocumentCode
    746370
  • Title

    On the non-ideal characteristics of Schottky-Barrier-gate diodes in In0.52Al0.48As/In0.53Ga0.47 As heterostructure FET´s on InP substrates

  • Author

    Sung, Roberto ; Das, Mukunda B.

  • Author_Institution
    Dept. of Electr. Eng., Pennsylvania State Univ., University Park, PA, USA
  • Volume
    42
  • Issue
    1
  • fYear
    1995
  • fDate
    1/1/1995 12:00:00 AM
  • Firstpage
    188
  • Lastpage
    190
  • Abstract
    We report results of determination of the zero-field barrier heights of Schottky-barrier-gate-diodes in InAlAs/InGaAs heterostructure modulation doped FET´s by exploiting their temperature dependent I-V characteristics. The field-emission model has been found to account for the gate current flow mechanism particularly at temperatures below 200 K. Using this model the influence of the InAlAs/InGaAs heterostructure potential barrier on the gate current has been delineated and a possible cause behind the current´s wide-range of variability, from 10-1 to 102 A/cm2 within 100 mV forward bias, has been suggested
  • Keywords
    III-V semiconductors; Schottky diodes; aluminium compounds; characteristics measurement; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device models; semiconductor heterojunctions; In0.52Al0.48As/In0.53Ga0.47 As heterostructure FET; InAlAs-InGaAs-InP; InP; InP substrates; Schottky-barrier-gate diodes; field-emission model; forward bias; gate current flow; heterostructure potential barrier; modulation doped FET; nonideal characteristics; temperature dependent I-V characteristics; zero-field barrier heights; Electronic equipment testing; Epitaxial layers; HEMTs; Indium compounds; Indium phosphide; MODFETs; Schottky barriers; Schottky diodes; Temperature dependence; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.370018
  • Filename
    370018