Title :
Fully Radiative Current Path Structure (FRACS) for sub-0.1 μm emitter transistor
Author :
Onai, Takahiro ; Nakazato, Kazuo ; Kiyota, Yukihiro ; Nakamura, Tohru
Author_Institution :
Central Res. Lab., Hitachi Ltd., Tokyo, Japan
fDate :
1/1/1995 12:00:00 AM
Abstract :
A new structure is proposed for bipolar transistors - FRACS (Fully Radiative Current Path Structure). A FRACS transistor has a line emitter and a cylindrical base and collector or a point emitter and a spherical base and collector. Device parameters of the FRACS transistor is obtained by extending the conventional one-dimensional transistor model to a two- or three-dimensional model. In this structure, base transit time is reduced as the emitter size is reduced by radiative collector current flow. Using this model, a general bipolar transistor with a shallow link base is found to increase the cutoff frequency as the emitter size is reduced. The Kirk effect is suppressed in this structure because of the small collector current density at the collector-base junction. The effect was experimentally examined. A cylindrical base was fabricated by thermal diffusion of boron to achieve the FRACS transistor. Cutoff frequency was observed to increase as the emitter size was reduced. Maximum cut-off frequency of 64 GHz was achieved by this transistor with a 25-nm thick base formed by rapid vapor-phase diffusion
Keywords :
millimetre wave bipolar transistors; rapid thermal processing; thermal diffusion; 0.1 micron; 25 nm; 64 GHz; FRACS transistor; Kirk effect suppression; Si:B; bipolar transistors; collector current density; collector-base junction; cutoff frequency; cylindrical base; cylindrical collector; emitter size reduction; fully radiative current path structure; line emitter; point emitter; radiative collector current flow; rapid vapor-phase diffusion; shallow link base; spherical base; spherical collector; sub-0.1 μm emitter transistor; thermal diffusion; three-dimensional model; two-dimensional model; Bipolar transistors; Boron; Charge carrier processes; Current density; Cutoff frequency; Degradation; Electron mobility; Germanium silicon alloys; Kirk field collapse effect; Silicon germanium;
Journal_Title :
Electron Devices, IEEE Transactions on