DocumentCode :
746906
Title :
Quantum-based Simulation analysis of scaling in ultrathin body device structures
Author :
Kumar, Arvind ; Kedzierski, Jakub ; Laux, Steven E.
Author_Institution :
IBM Semicond. R&D Center, Yorktown Heights, NY, USA
Volume :
52
Issue :
4
fYear :
2005
fDate :
4/1/2005 12:00:00 AM
Firstpage :
614
Lastpage :
617
Abstract :
We present self-consistent solutions of ultrathin body device structures to understand the influence of quantum-mechanical confinement on the predictions of classical scaling theory. We show that two-dimensional (2-D) electrostatics considerations play a more dominant role than quantum-mechanical effects in the subthreshold behavior of ultrathin fully depleted silicon-on-insulator structures. We also show how modifications to the doping profile can be used to alleviate 2-D short-channel effects.
Keywords :
MOSFET; doping profiles; electrostatics; quantum theory; semiconductor device models; silicon-on-insulator; 2D electrostatics; 2D short-channel effects; MOSFET scaling; classical scaling theory; doping profile; fully depleted silicon-on-insulator structures; quantum-based simulation analysis; quantum-mechanical confinement; quantum-mechanical effects; silicon-on-insulator technology; ultrathin body device structures; Analytical models; Dielectrics and electrical insulation; Doping profiles; Electrostatics; Geometry; MOSFET circuits; Potential well; Quantum mechanics; Silicon on insulator technology; Two dimensional displays; MOSFET scaling; Modeling; silicon-on-insulator (SOI) technology;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2005.844792
Filename :
1408166
Link To Document :
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