DocumentCode
747255
Title
Comparison of device performance of highly strained Ga1-xInxAs/Al0.48In0.52As (0.53
Author
Chang, T.Y. ; Feuer, Mark D. ; Lalevic, B.
Volume
28
Issue
3
fYear
1992
Firstpage
329
Lastpage
330
Abstract
A series of 1.3 mu m gate length Ga1-xInxAs/Al0.48In0.52As MODFETs covering a wide range of x values in the channel (0.53or=0.77) has been successfully fabricated and compared. Although the maximum values of transconductance (1010 mS/mm), saturated drain current density (920 mA/mm), and room-temperature mobility are obtained with x=0.85, lower x values of 0.77-0.80 are found to offer the highest 77 K mobility and the best cutoff-frequency-gate-length product.
Keywords
III-V semiconductors; aluminium compounds; carrier mobility; gallium arsenide; high electron mobility transistors; indium compounds; 1.3 micron; Ga 1-xIn xAs-Al 0.48In 0.52As; III-V semiconductors; MODFETs; cutoff-frequency-gate-length product; device performance; gate length; room-temperature mobility; saturated drain current density; strain compensation; transconductance;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19920204
Filename
121455
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