Influence of Residual Facet Reflection on the Eye-Diagram Performance of High-Speed Electroabsorption Modulated Lasers

Author

Sun, Changzheng ; Xiong, Bing ; Wang, Jian ; Cai, Pengfei ; Xu, Jianming ; Zhou, Qiwei ; Luo, Yi

Author_Institution

Dept. of Electron. Eng., Tsinghua Univ., Beijing, China

Volume

27

Issue

15

fYear

2009

Firstpage

2970

Lastpage

2976

Abstract

The influence of residual facet reflection on the small-signal modulation response and the large-signal eye-diagram performance of 40 Gb/s electroabsorption modulated lasers (EMLs) is studied. Measurement and simulation show that the eye-diagram performance is not only limited by the modulation bandwidth of the device, but also significantly degraded by the low frequency resonances in the frequency response due to residual facet reflection. Clear eye-opening has been demonstrated by optimizing the anti-reflection (AR) coating of the EA modulator facet.

Keywords

antireflection coatings; distributed feedback lasers; electro-optical modulation; electroabsorption; high-speed optical techniques; light reflection; semiconductor lasers; antireflection coating; eye-diagram performance; high-speed electroabsorption modulated lasers; residual facet reflection; small-signal modulation; Anti-reflection (AR) coating; distributed feedback (DFB) lasers; electroabsorption (EA) modulators; eye-diagram; monolithic integration; optical reflection;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/JLT.2008.2007654

Filename

4838342