DocumentCode :
748233
Title :
The effects of ionizing radiation on power-MOSFET termination structures
Author :
Davis, K.R. ; Schrimpf, R.D. ; Cellier, F.E. ; Galloway, K.F. ; Burton, D.I. ; Wheatley, C.F., Jr.
Author_Institution :
Dept. of Electr. & Comput. Eng., Arizona Univ., Tucson, AZ, USA
Volume :
36
Issue :
6
fYear :
1989
fDate :
12/1/1989 12:00:00 AM
Firstpage :
2104
Lastpage :
2109
Abstract :
The effects of ionizing radiation on power-MOSFET termination structures were examined through two-dimensional simulation. A wide range of sensitivity to surface-charge density was found for various devices employing floating field rings and/or equipotential field plates. Termination structures that were both insensitive to surface charge and possessed a high breakdown voltage were identified. The results are compared with measurements made on selected structures. Insights into the design of optimum termination structures are obtained
Keywords :
digital simulation; electric breakdown of solids; insulated gate field effect transistors; power transistors; radiation effects; breakdown voltage; computer code; equipotential field plates; floating field rings; ionising radiation effects; optimum termination structures; power-MOSFET termination structures; sensitivity; surface-charge density; two-dimensional simulation; Avalanche breakdown; Computational modeling; Computer simulation; Doping; Electric breakdown; Impact ionization; Ionizing radiation; MOSFETs; P-n junctions; Termination of employment;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.45411
Filename :
45411
Link To Document :
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