DocumentCode
75042
Title
Fabrication and Measurement of Sidewall Gratings Integrated in Hybrid As2S3 -Ti:LiNbO3 Optical Waveguides
Author
Xin Wang ; Yifeng Zhou ; Madsen, C.K.
Author_Institution
Dept. of Electr. & Comput. Eng., Texas A&M Univ., College Station, TX, USA
Volume
32
Issue
17
fYear
2014
fDate
Sept.1, 1 2014
Firstpage
2989
Lastpage
2995
Abstract
In this paper, we demonstrated the fabrication and measurement of sidewall gratings integrated in a hybrid type of optical waveguide: As2S3-Ti:LiNbO3. This hybrid waveguide is constructed by patterning arsenic tri-sulfide (As2S3) strips on the midline of titanium-diffused channel waveguide in lithium niobate (Ti:LiNbO3). Sidewall gratings are written on both sidewalls of As2S3 strips by electron beam lithography (EBL) with 3% PMMA resist and a dose 350 μC/cm 2 at 50-kV electrons. The measured reflectance bandwidth was between 2.4 and 6.7 nm. Coupling coefficients ranging from 2.5 to 8.9 mm-1 were obtained. A transmission peak with a 3-dB bandwidth of ~0.25 nm was observed in the rejection band of a 432 μm-long phase-shifted sidewall grating. Such sidewall gratings integrated in hybrid As2S3-Ti:LiNbO3 waveguide can be used for numerous integrated optical devices including optical filters, switches, modulators, lasers, sensors, and wavelength division multiplexing (WDM).
Keywords
arsenic compounds; diffraction gratings; electron beam lithography; integrated optics; lithium compounds; optical fabrication; optical waveguides; reflectivity; titanium; EBL; LiNbO3:As2S3-Ti; PMMA resist; WDM; arsenic trisulfide; coupling coefficients; electron beam lithography; hybrid As2S3 -Ti:LiNbO3 optical waveguides; integrated optical devices; lithium niobate; optical filters; optical modulators; optical switches; patterning; reflectance bandwidth; sidewall gratings; titanium-diffused channel waveguide; wavelength division multiplexing; Couplings; Gratings; Lithium niobate; Optical device fabrication; Optical waveguides; Reflectivity; Strips; Arsenic tri-sulfide; electron beam lithography,integrated optical devices; linear tapers; lithium niobate; sidewall gratings; waveguides;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.2014.2334054
Filename
6846347
Link To Document