• DocumentCode
    752546
  • Title

    Spectroscopic line behavior in a DC copper vacuum arc operated with background gas

  • Author

    Grondona, Diana ; Kelly, Héctor ; Màrquez, Adriana ; Lepone, Alejandro

  • Author_Institution
    Departamento de Fisica, Instituto de Fisica del Plasma, Buenos Aires, Argentina
  • Volume
    30
  • Issue
    1
  • fYear
    2002
  • fDate
    2/1/2002 12:00:00 AM
  • Firstpage
    391
  • Lastpage
    396
  • Abstract
    The behavior of some selected visible spectral lines emitted in the interelectrode space of a Copper vacuum arc operated with background gases (mainly Oxygen gas) is determined in terms of the gas filling pressure value. It is found that the behavior of these Cu I and Cu II lines with the gas pressure value is essentially the opposite: after an intensity "plateau" at low-pressure values, the CuI line intensity grows, while the corresponding Cu II intensity decreases. On the other hand, no transitions corresponding to Cu III were registered within the spectral range investigated (340 to 600 nm). The measured line intensities are compared with the particle densities calculated with a one-dimensional model, which includes four metallic species (having no inner structure) with different charge state, and takes into account ion slowing down by elastic scattering with neutrals, radial diffusion loses to the chamber wall, charge-exchange processes with neutrals and ionization (or recombination) of the gas molecules (or gaseous ions) by electron impact. It is inferred that the population of an excited level responsible for a given emission line is much smaller (of the order of 103-104 cm-3) than those expected for the fundamental levels of the particles. The explanation for the observed behavior of these spectral lines with the pressure value rests on the local generation of excited states from lower lying levels by electron impact, but admitting the presence of a certain amount of metal vapor (generated by microdroplet evaporation in the vicinities of the cathode surface) in the interelectrode region
  • Keywords
    copper; plasma diagnostics; spectral line intensity; vacuum arcs; 340 to 600 nm; Cu; DC Cu vacuum arc; background gas; cathode surface; charge state; charge-exchange processes; elastic scattering; electron impact; emission line; excited level; excited states; gas filling pressure; gas molecules; interelectrode region; interelectrode space; line intensities; metallic species; microdroplet evaporation; one-dimensional model; particle densities; radial diffusion; spectroscopic line behavior; visible spectral lines; Charge measurement; Copper; Current measurement; Density measurement; Electrons; Filling; Gases; Oxygen; Spectroscopy; Vacuum arcs;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2002.1003886
  • Filename
    1003886