Improvement of fabrication yield and loss uniformity of waveguide mirror

Author

Park, Jeong-Woo ; Sim, Eun-Deok ; Beak, Yong-Soon

Author_Institution

Opt. Commun. Devices Dept., Electron. & Telecommun. Res. Inst., Daejeon, South Korea

Volume

17

Issue

4

fYear

2005

fDate

4/1/2005 12:00:00 AM

Firstpage

807

Lastpage

809

Abstract

Using a calculation of overlap integral loss of waveguide mirror was analyzed. According to this analysis method, a taper section was introduced and loss of deep ridge waveguide mirror was improved by 1.1 dB. Analysis shows that the most significant source of loss is the bevel angle of mirror facet. Also, using this method, improvement of fabrication yield and uniformity was obtained. This analysis and design method can be applied to mirrors for integrated photonic circuits and optical printed circuit board.

Keywords

integrated optics; mirrors; optical design techniques; optical fabrication; optical losses; optical waveguides; ridge waveguides; 1.1 dB; deep ridge waveguide mirror; fabrication yield; integrated photonic circuits; optical printed circuit board; overlap integral loss; Circuits; Etching; Mirrors; Optical device fabrication; Optical devices; Optical fiber communication; Optical losses; Optical waveguide components; Optical waveguides; Turning; Integrated optics; mirrors; optical waveguide components;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2005.843686

Filename

1411883