• DocumentCode
    752723
  • Title

    Bifurcation to chaos in charged particle orbits in a magnetic reversal with shear field

  • Author

    Ynnerman, A. ; Chapman, S.C. ; Ljung, P. ; Andersson, N.

  • Author_Institution
    Dept. of Sci. & Technol., Linkoping Univ., Norrkoping, Sweden
  • Volume
    30
  • Issue
    1
  • fYear
    2002
  • fDate
    2/1/2002 12:00:00 AM
  • Firstpage
    18
  • Lastpage
    19
  • Abstract
    Regular and stochastic behavior in single particle orbits in static magnetic reversals have wide application in laboratory and physical plasmas. In a simple magnetic reversal, the system has three degrees of freedom but only two global (exact) constants of the motion; the system is nonintegrable and the particle motion can, under certain conditions, exhibit chaotic behavior. Here, we consider the dynamics when a constant shear field is added. In this case, the form of the potential changes from quadratic to velocity dependent. We use numerically integrated trajectories to show that the effect of the shear field is to break the symmetry of the system so that the topology of the invariant tori of regular orbits is changed. In this case, invariant tori take the form of nested Moebius strips in the presence of the shear field. The route to chaos is via bifurcation (period doubling) of the Moebius strip tori
  • Keywords
    bifurcation; chaos; integration; plasma theory; plasma transport processes; stochastic processes; Moebius strip tori; bifurcation to chaos; chaotic behavior; charged particle orbits; constant shear field; current sheets; degrees of freedom; global constants; invariant tori; nested Moebius strips; nonintegrable system; numerically integrated trajectories; particle motion; period doubling; quadratic dependent potential; regular behavior; regular orbits; route to chaos; shear field; single particle dynamics; static magnetic reversal; stochastic behavior; symmetry breaking; topology; velocity dependent potential; virtual reality; Bifurcation; Chaos; Equations; Laboratories; Orbits; Plasma applications; Stochastic processes; Strips; Topology; Virtual reality;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2002.1003902
  • Filename
    1003902