Dynamics of mode transitions in inductively-coupled plasmas

Author

Ostrikov, Kostya ; Tsakadze, E. ; Ning, Jiang ; Tsakadze, Z. ; JiDong, Long ; Storer, R. ; Xu, Shuyan

Author_Institution

Plasma Process. Lab., Nanyang Technol. Univ., Singapore

Volume

30

Issue

1

fYear

2002

fDate

2/1/2002 12:00:00 AM

Firstpage

128

Lastpage

129

Abstract

The dynamics of transitions between the electrostatic and electromagnetic discharge modes of the low-frequency (460 kHz) inductively coupled plasma (LF ICP) reactor is studied. A series of images of plasma glows in Ar and N₂ gases taken in the process of continuous variation of the input power confirms the discharge bistability and hysteresis. The operation regimes and parameters making the LF ICP reactor attractive for materials synthesis and processing applications are discussed

Keywords

argon; nitrogen; plasma instability; 460 kHz; Ar; N₂; discharge bistability; electromagnetic discharge modes; electrostatic discharge modes; hysteresis; inductively-coupled plasmas; low-frequency inductively coupled plasma; materials synthesis; mode transition; mode transitions; processing applications; Argon; Electrostatics; Hysteresis; Inductors; Plasma applications; Plasma materials processing; Plasma measurements; Plasma sources; Plasma stability; Radio frequency;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2002.1003957

Filename

1003957