• DocumentCode
    753370
  • Title

    Evolution of charged particle densities after laser-induced photodetachment in a strongly electronegative RF discharge

  • Author

    Yan, M. ; Bogaerts, A. ; Gijbels, R.

  • Author_Institution
    Dept. of Chem., Antwerp Univ., Belgium
  • Volume
    30
  • Issue
    1
  • fYear
    2002
  • fDate
    2/1/2002 12:00:00 AM
  • Firstpage
    132
  • Lastpage
    133
  • Abstract
    The temporal and spatial evolutions of charged particle densities after laser induced photodetachment in a SiH4/H2 RF discharge have been modeled by a particle-in-cell/Monte Carlo (PIC/MC) method. Two dips in the evolution of the electron density and the positive ion density, which are observed by experiments in the literature, are explained. The images indicate that the two dips occur at different moments in time
  • Keywords
    Monte Carlo methods; electron detachment; high-frequency discharges; plasma density; plasma light propagation; SiH4-H2; SiH4/H2; charged-particle density; electron density; ion density; laser induced photodetachment; laser-induced photodetachment; particle-in-cell/Monte Carlo method; strongly electronegative RF discharge; Chemical lasers; Couplings; Density measurement; Electrodes; Electrons; Gas lasers; Laser modes; Monte Carlo methods; Optical pulses; Radio frequency;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2002.1003959
  • Filename
    1003959
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=753370